相分離高分子共混薄膜退火和準淬火的原位原子力顯微鏡研究。
writer：廖永貴，由吉春，李學，孫昭艷，石彤非，安立佳。
keywords：高等學校化學學報，2005, 26(9): 1777-1779.
source：期刊
The morphology and phase shift of phase-separated PMMA/SAN thin film on silicon wafer were studied by in situ AFM with hot stage through the annealing and quasi-quenching. The results show that the phase shifts are different between high temperature and room temperature, and between ultrahigh vacuum and ambient and between in situ and ex situ although the morphologies are almost invariable. The reasons were discussed simply.