Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes
writer：3. Yonghong Men, Peng Xiao, Jing Chen*, Jun Fu, Youju Huang , Jiawei Zhang, Zhengchao Xie, Wenqin Wa
keywords：Polymer brush
source：期刊
specific source：Langmuir 2014, 30, 4863-4867.
Issue time：2014年
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.